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74 FR 56374, Oct. 30, 2009, unless otherwise noted.
75 FR 74818, Dec. 1, 2010, unless otherwise noted.
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At 90 FR 21227, May 19, 2025, as required by the Congressional Review Act and Public Law 119-2, the Environmental Protection Agency removed the amendments to §§ 98.3 and 98.4 made effective on Jan. 17, 2025, at 89 FR 91163, Nov. 18, 2024. As of May 19, 2025, §§ 98.3 and 98.4 reverted to the Jan. 16, 2025 version.
| Process type/sub-type | Process gas i | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| CF4 | C2 F6 | CHF3 | CH2 F2 | CH3 F | C3 F8 | C4 F8 | NF3 | SF6 | C4 F6 | C5 F8 | C4 F8 O | |
| Etching/Wafer Cleaning | ||||||||||||
| 1-Ui | 0.65 | 0.80 | 0.37 | 0.20 | 0.30 | 0.30 | 0.18 | 0.16 | 0.30 | 0.15 | 0.10 | NA |
| BCF4 | NA | 0.21 | 0.076 | 0.060 | 0.0291 | 0.21 | 0.045 | 0.044 | 0.033 | 0.059 | 0.11 | NA |
| BC2 F6 | 0.058 | NA | 0.058 | 0.043 | 0.009 | 0.018 | 0.027 | 0.045 | 0.041 | 0.062 | 0.083 | NA |
| BC4 F8 | 0.0046 | NA | 0.0027 | 0.054 | 0.0070 | NA | NA | NA | NA | 0.0051 | NA | NA |
| BC3 F8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | 0.00012 | NA |
| BCHF3 | 0.012 | NA | NA | 0.057 | 0.016 | 0.012 | 0.028 | 0.023 | 0.0039 | 0.017 | 0.0069 | NA |
| BCH2 F2 | 0.005 | NA | 0.0024 | NA | 0.0033 | NA | 0.0021 | 0.00074 | 0.000020 | 0.000030 | NA | NA |
| BCH3 F | 0.0061 | NA | 0.027 | 0.0036 | NA | 0.00073 | 0.0063 | 0.0080 | 0.0082 | 0.00065 | NA | NA |
| Chamber Cleaning | ||||||||||||
| In situ plasma cleaning | ||||||||||||
| 1-Ui | NA | NA | NA | NA | NA | NA | NA | 0.20 | NA | NA | NA | NA |
| BCF4 | NA | NA | NA | NA | NA | NA | NA | 0.037 | NA | NA | NA | NA |
| BC2 F6 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC3 F8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| Remote plasma cleaning | ||||||||||||
| 1-Ui | NA | NA | NA | NA | NA | 0.063 | NA | 0.018 | NA | NA | NA | NA |
| BCF4 | NA | NA | NA | NA | NA | NA | NA | 0.037 | NA | NA | NA | NA |
| BC2 F6 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC3 F8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BCHF3 | NA | NA | NA | NA | NA | NA | NA | 0.000059 | NA | NA | NA | NA |
| BCH2 F2 | NA | NA | NA | NA | NA | NA | NA | 0.00088 | NA | NA | NA | NA |
| BCH3 F | NA | NA | NA | NA | NA | NA | NA | 0.0028 | NA | NA | NA | NA |
| BF2 | NA | NA | NA | NA | NA | NA | NA | 0.5 | NA | NA | NA | NA |
| In situ thermal cleaning | ||||||||||||
| 1-Ui | NA | NA | NA | NA | NA | NA | NA | 0.28 | NA | NA | NA | NA |
| BCF4 | NA | NA | NA | NA | NA | NA | NA | 0.010 | NA | NA | NA | NA |
| BC2 F6 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| BC3 F8 | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA | NA |
| Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type. | ||||||||||||
[89 FR 31921, Apr. 25, 2024]